Overview of High quality Boron Carbide B4C Sputtering Target /Plate / Rod /Tube
Boron Carbide (B4C) is a ceramic compound renowned for its exceptional hardness and wear resistance, ranking just below diamond and cubic boron nitride in terms of hardness. Composed of boron and carbon atoms arranged in a covalently bonded crystal structure, it exhibits unique physical and chemical properties that make it highly valuable in various industrial and military applications. Boron carbide’s high melting point, low density, neutron-absorbing capability, and extreme toughness further distinguish it among advanced materials.
Features of High quality Boron Carbide B4C Sputtering Target /Plate / Rod /Tube
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Extreme Hardness: With a Mohs hardness of around 9.3 to 9.5, boron carbide is one of the hardest materials known, surpassed only by diamond and cubic boron nitride.
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Lightweight: Despite its hardness, boron carbide has a relatively low density of about 2.52 g/cm³, which makes it an attractive material for lightweight armor systems.
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Thermal Stability: It possesses excellent thermal stability, maintaining its properties up to temperatures around 2,000°C, making it suitable for high-temperature applications.
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Neutron Absorption: Boron carbide is a potent neutron absorber due to its boron content, making it ideal for nuclear shielding and control rods.
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Chemical Resistance: Resistant to most acids and alkalis, except for hydrofluoric acid and hot concentrated alkaline solutions, ensuring durability in corrosive environments.
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Abrasion Resistance: Its exceptional wear resistance makes it suitable for applications where friction and abrasion are prevalent, such as sandblasting nozzles.
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Parameters of High quality Boron Carbide B4C Sputtering Target /Plate / Rod /Tube
Boron carbide (B4C) is a high-quality sputtering target used in the synthesis of advanced materials such as diamonds, silicones, and ceramics. The properties of B4C determine its suitability for various applications.
The most important parameter affecting the sputtering performance of B4C is its melting point, which is the temperature at which it will melt and flow under standard conditions. A higher melting point indicates that B4C has a higher density and may be more suitable for certain types of material synthesis.
Other parameters that affect the sputtering performance of B4C include its particle size, composition, and purity. Smaller particles of B4C tend to have better sputtering yields than larger particles due to their increased surface area. The composition of B4C can also affect its sputtering performance by determining the type of reactive species that can be generated during the sputtering process. High-purity B4C typically results in higher sputtering yields and better mechanical properties.
In addition, the sputtering rate and duration can also impact the performance of B4C. Higher sputtering rates tend to result in faster erosion of the substrate material, while longer sputtering times allow for more complete etching of the substrate. The optimal sputtering rate and duration depend on the specific application and the desired properties of the final product.
Overall, the performance of B4C sputtering targets depends on a range of factors, including its melting point, particle size, composition, sputtering rate, and duration. Choosing the right B4C sputtering target is crucial for achieving the desired properties of the final product.
(High quality Boron Carbide B4C Sputtering Target /Plate / Rod /Tube)
Applications of High quality Boron Carbide B4C Sputtering Target /Plate / Rod /Tube
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Armor Systems: Widely used in body armor, vehicle armor, and bulletproof vests due to its lightweight and superior protection capabilities.
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Nuclear Applications: As control rods and shielding material in nuclear reactors because of its neutron absorbing properties.
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Abrasive and Cutting Tools: In grinding wheels, polishing powders, and cutting tools due to its hardness and wear resistance.
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Industrial Nozzles: For sandblasting and water jet cutting applications where resistance to wear and erosion is critical.
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Military and Defense: As a component in armor-piercing projectiles and defensive systems.
Company Profile
MyCarbides is a trusted global chemical material supplier & manufacturer with over 12-year-experience in providing super high-quality carbides and relative products.
The company has a professional technical department and Quality Supervision Department, a well-equipped laboratory, and equipped with advanced testing equipment and after-sales customer service center.
If you are looking for high-quality carbide materials and relative products, please feel free to contact us or click on the needed products to send an inquiry.
Payment Methods
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Shipment
It could be shipped by sea, by air, or by reveal ASAP as soon as repayment receipt.
FAQs of High quality Boron Carbide B4C Sputtering Target /Plate / Rod /Tube
Q: Is High quality Boron Carbide B4C Sputtering Target /Plate / Rod /Tube toxic?
A: Pure boron carbide is generally considered safe to handle. However, during machining or grinding, dust inhalation can be a concern, requiring proper ventilation and protective equipment.
Q: Can High quality Boron Carbide B4C Sputtering Target /Plate / Rod /Tube be machined?
A: Due to its extreme hardness, machining boron carbide is difficult and requires specialized techniques and diamond tooling. Grinding, EDM (Electrical Discharge Machining), or laser cutting are common methods.
Q: How does High quality Boron Carbide B4C Sputtering Target /Plate / Rod /Tube compare to tungsten carbide in terms of hardness?
A: High quality Boron Carbide B4C Sputtering Target /Plate / Rod /Tube is harder than tungsten carbide, with a Mohs hardness of around 9.3 to 9.5 compared to tungsten carbide’s 8.5 to 9.
Q: What is the primary use of High quality Boron Carbide B4C Sputtering Target /Plate / Rod /Tube in the military sector?
A: High quality Boron Carbide B4C Sputtering Target /Plate / Rod /Tube is primarily used in the military for body armor, armored vehicles, and as a component in armor-piercing ammunition due to its combination of hardness, light weight, and ballistic performance.
Q: Can High quality Boron Carbide B4C Sputtering Target /Plate / Rod /Tube be used in high-temperature applications?
A: Yes, High quality Boron Carbide B4C Sputtering Target /Plate / Rod /Tube maintains its structural integrity and properties up to very high temperatures, making it suitable for use in extreme heat environments such as furnace linings and high-temperature ceramics.
(High quality Boron Carbide B4C Sputtering Target /Plate / Rod /Tube)
