Overview of 99.9% 3N Boron Carbide B4C/SICTarget PLATES/SHEETS/OEM Size high purity B4C sputtering target tiles
Boron Carbide (B4C) is a ceramic compound renowned for its exceptional hardness and wear resistance, ranking just below diamond and cubic boron nitride in terms of hardness. Composed of boron and carbon atoms arranged in a covalently bonded crystal structure, it exhibits unique physical and chemical properties that make it highly valuable in various industrial and military applications. Boron carbide’s high melting point, low density, neutron-absorbing capability, and extreme toughness further distinguish it among advanced materials.
Features of 99.9% 3N Boron Carbide B4C/SICTarget PLATES/SHEETS/OEM Size high purity B4C sputtering target tiles
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Extreme Hardness: With a Mohs hardness of around 9.3 to 9.5, boron carbide is one of the hardest materials known, surpassed only by diamond and cubic boron nitride.
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Lightweight: Despite its hardness, boron carbide has a relatively low density of about 2.52 g/cm³, which makes it an attractive material for lightweight armor systems.
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Thermal Stability: It possesses excellent thermal stability, maintaining its properties up to temperatures around 2,000°C, making it suitable for high-temperature applications.
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Neutron Absorption: Boron carbide is a potent neutron absorber due to its boron content, making it ideal for nuclear shielding and control rods.
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Chemical Resistance: Resistant to most acids and alkalis, except for hydrofluoric acid and hot concentrated alkaline solutions, ensuring durability in corrosive environments.
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Abrasion Resistance: Its exceptional wear resistance makes it suitable for applications where friction and abrasion are prevalent, such as sandblasting nozzles.
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Parameters of 99.9% 3N Boron Carbide B4C/SICTarget PLATES/SHEETS/OEM Size high purity B4C sputtering target tiles
The given information is incomplete and does not provide enough details to determine the appropriate parameters for a specific target task or material. However, in general, the following parameters might be useful:
1. Material: Boron carbide (B4C) is a commonly used beryllium-based semiconductor material with a low dielectric constant and high thermal conductivity.
2. The target material(s): Sputtering targets can range from a broad range of materials such as aluminum, silicon, germanium,argent, cobalt, and others, depending on the application requirements and desired level of sensitivity.
3. Element concentration: The element concentration in the target material(s) should be selected based on the requirements of the target and intended application. For example, high-sensitivity targets may require high concentrations of boron and cation elements.
4. Dielectric properties: The dielectric properties of the target material(s) are crucial for achieving high performance and stability under the operating conditions of the tool. The choice of dielectric properties can affect the achievable integration depth, tunneling efficiency, and the number of nanotubes formed.
5. Cleanroom conditions: The target material(s) must be carefully prepared and cleaned to ensure their optimal performance. The cleanroom conditions should include temperature control, airflow management, and humidity control to minimize heat loss and promote the proper functioning of the surface.
6. Tin content: Boron carbide is often sensitive to certain levels of tin in the presence of other metals, including tungsten and tantalum. To reduce the risk of contamination, the target material(s) must be prepared with sufficient tin levels.
7. Lifetime: The lifetime of the target material(s) should be determined based on the expected endurance and practicality of the application. A longer lifetime will increase the overall reliability of the tool and improve the precision and accuracy of the measurement.
Overall, the appropriate parameters for a target task or material will depend on the specific requirements and constraints of the application. It’s recommended to consult technical documents, manufacturers’ specifications, or seek expert advice to get the most accurate and effective guidance.
(99.9% 3N Boron Carbide B4C/SICTarget PLATES/SHEETS/OEM Size high purity B4C sputtering target tiles)
Applications of 99.9% 3N Boron Carbide B4C/SICTarget PLATES/SHEETS/OEM Size high purity B4C sputtering target tiles
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Armor Systems: Widely used in body armor, vehicle armor, and bulletproof vests due to its lightweight and superior protection capabilities.
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Nuclear Applications: As control rods and shielding material in nuclear reactors because of its neutron absorbing properties.
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Abrasive and Cutting Tools: In grinding wheels, polishing powders, and cutting tools due to its hardness and wear resistance.
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Industrial Nozzles: For sandblasting and water jet cutting applications where resistance to wear and erosion is critical.
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Military and Defense: As a component in armor-piercing projectiles and defensive systems.
Company Profile
MyCarbides is a trusted global chemical material supplier & manufacturer with over 12-year-experience in providing super high-quality carbides and relative products.
The company has a professional technical department and Quality Supervision Department, a well-equipped laboratory, and equipped with advanced testing equipment and after-sales customer service center.
If you are looking for high-quality carbide materials and relative products, please feel free to contact us or click on the needed products to send an inquiry.
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FAQs of 99.9% 3N Boron Carbide B4C/SICTarget PLATES/SHEETS/OEM Size high purity B4C sputtering target tiles
Q: Is 99.9% 3N Boron Carbide B4C/SICTarget PLATES/SHEETS/OEM Size high purity B4C sputtering target tiles toxic?
A: Pure boron carbide is generally considered safe to handle. However, during machining or grinding, dust inhalation can be a concern, requiring proper ventilation and protective equipment.
Q: Can 99.9% 3N Boron Carbide B4C/SICTarget PLATES/SHEETS/OEM Size high purity B4C sputtering target tiles be machined?
A: Due to its extreme hardness, machining boron carbide is difficult and requires specialized techniques and diamond tooling. Grinding, EDM (Electrical Discharge Machining), or laser cutting are common methods.
Q: How does 99.9% 3N Boron Carbide B4C/SICTarget PLATES/SHEETS/OEM Size high purity B4C sputtering target tiles compare to tungsten carbide in terms of hardness?
A: 99.9% 3N Boron Carbide B4C/SICTarget PLATES/SHEETS/OEM Size high purity B4C sputtering target tiles is harder than tungsten carbide, with a Mohs hardness of around 9.3 to 9.5 compared to tungsten carbide’s 8.5 to 9.
Q: What is the primary use of 99.9% 3N Boron Carbide B4C/SICTarget PLATES/SHEETS/OEM Size high purity B4C sputtering target tiles in the military sector?
A: 99.9% 3N Boron Carbide B4C/SICTarget PLATES/SHEETS/OEM Size high purity B4C sputtering target tiles is primarily used in the military for body armor, armored vehicles, and as a component in armor-piercing ammunition due to its combination of hardness, light weight, and ballistic performance.
Q: Can 99.9% 3N Boron Carbide B4C/SICTarget PLATES/SHEETS/OEM Size high purity B4C sputtering target tiles be used in high-temperature applications?
A: Yes, 99.9% 3N Boron Carbide B4C/SICTarget PLATES/SHEETS/OEM Size high purity B4C sputtering target tiles maintains its structural integrity and properties up to very high temperatures, making it suitable for use in extreme heat environments such as furnace linings and high-temperature ceramics.
(99.9% 3N Boron Carbide B4C/SICTarget PLATES/SHEETS/OEM Size high purity B4C sputtering target tiles)
