Boron Carbide

Boron carbide B4C for Boron Carbide B4C Sputtering Target /Plate / Rod /Tube

Boron Carbide is a remarkable ceramic material that stands out for its unique blend of properties, including its unparalleled hardness, low density, and neutron-absorbing capabilities.

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Overview of Boron carbide B4C for Boron Carbide B4C Sputtering Target /Plate / Rod /Tube

Boron Carbide (B4C) is a ceramic compound renowned for its exceptional hardness and wear resistance, ranking just below diamond and cubic boron nitride in terms of hardness. Composed of boron and carbon atoms arranged in a covalently bonded crystal structure, it exhibits unique physical and chemical properties that make it highly valuable in various industrial and military applications. Boron carbide’s high melting point, low density, neutron-absorbing capability, and extreme toughness further distinguish it among advanced materials.

Features of Boron carbide B4C for Boron Carbide B4C Sputtering Target /Plate / Rod /Tube

  1. Extreme Hardness: With a Mohs hardness of around 9.3 to 9.5, boron carbide is one of the hardest materials known, surpassed only by diamond and cubic boron nitride.

  2. Lightweight: Despite its hardness, boron carbide has a relatively low density of about 2.52 g/cm³, which makes it an attractive material for lightweight armor systems.

  3. Thermal Stability: It possesses excellent thermal stability, maintaining its properties up to temperatures around 2,000°C, making it suitable for high-temperature applications.

  4. Neutron Absorption: Boron carbide is a potent neutron absorber due to its boron content, making it ideal for nuclear shielding and control rods.

  5. Chemical Resistance: Resistant to most acids and alkalis, except for hydrofluoric acid and hot concentrated alkaline solutions, ensuring durability in corrosive environments.

  6. Abrasion Resistance: Its exceptional wear resistance makes it suitable for applications where friction and abrasion are prevalent, such as sandblasting nozzles.

Boron carbide B4C for Boron Carbide B4C Sputtering Target /Plate / Rod /Tube

(Boron carbide B4C for Boron Carbide B4C Sputtering Target /Plate / Rod /Tube)

Parameters of Boron carbide B4C for Boron Carbide B4C Sputtering Target /Plate / Rod /Tube

Theboron carbide B4C sputtering target, plate, rod, and tube parameters can vary depending on the type of sputtering program being used and the desired characteristics of the material to be sputtered.

Here are some general parameters that may be important for boron carbide B4C sputtering:

1. Field strength: This refers to the amount of force required to push or apply an object through the sputtering process.
2. Pulse rate: This is the frequency with which the sputtering mechanism is applied in real time.
3. Power output: The power required to rotate the sputtering plate, rod, and tube at each pulse.
4. Etched depth: The maximum distance from the surface of the material to be etched.
5. Temperature: The temperature at which the material is sputtered.
6. Incarnation: Whether a material needs to be reduced or melted in order to be sputtered.

It’s important to note that the specific parameters used will depend on the materials being targeted, their composition, and the goals of the sputtering program. It’s always recommended to consult the technical documentation for specific products to determine the most appropriate parameters for your application.

Boron carbide B4C for Boron Carbide B4C Sputtering Target /Plate / Rod /Tube

(Boron carbide B4C for Boron Carbide B4C Sputtering Target /Plate / Rod /Tube)

Applications of Boron carbide B4C for Boron Carbide B4C Sputtering Target /Plate / Rod /Tube

  1. Armor Systems: Widely used in body armor, vehicle armor, and bulletproof vests due to its lightweight and superior protection capabilities.

  2. Nuclear Applications: As control rods and shielding material in nuclear reactors because of its neutron absorbing properties.

  3. Abrasive and Cutting Tools: In grinding wheels, polishing powders, and cutting tools due to its hardness and wear resistance.

  4. Industrial Nozzles: For sandblasting and water jet cutting applications where resistance to wear and erosion is critical.

  5. Military and Defense: As a component in armor-piercing projectiles and defensive systems.

Company Profile

MyCarbides is a trusted global chemical material supplier & manufacturer with over 12-year-experience in providing super high-quality carbides and relative products.

The company has a professional technical department and Quality Supervision Department, a well-equipped laboratory, and equipped with advanced testing equipment and after-sales customer service center.

If you are looking for high-quality carbide materials and relative products, please feel free to contact us or click on the needed products to send an inquiry.

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Shipment

It could be shipped by sea, by air, or by reveal ASAP as soon as repayment receipt.

FAQs of Boron carbide B4C for Boron Carbide B4C Sputtering Target /Plate / Rod /Tube

Q: Is Boron carbide B4C for Boron Carbide B4C Sputtering Target /Plate / Rod /Tube toxic?
A: Pure boron carbide is generally considered safe to handle. However, during machining or grinding, dust inhalation can be a concern, requiring proper ventilation and protective equipment.

Q: Can Boron carbide B4C for Boron Carbide B4C Sputtering Target /Plate / Rod /Tube be machined?
A: Due to its extreme hardness, machining boron carbide is difficult and requires specialized techniques and diamond tooling. Grinding, EDM (Electrical Discharge Machining), or laser cutting are common methods.

Q: How does Boron carbide B4C for Boron Carbide B4C Sputtering Target /Plate / Rod /Tube compare to tungsten carbide in terms of hardness?
A: Boron carbide B4C for Boron Carbide B4C Sputtering Target /Plate / Rod /Tube is harder than tungsten carbide, with a Mohs hardness of around 9.3 to 9.5 compared to tungsten carbide’s 8.5 to 9.

Q: What is the primary use of Boron carbide B4C for Boron Carbide B4C Sputtering Target /Plate / Rod /Tube in the military sector?
A: Boron carbide B4C for Boron Carbide B4C Sputtering Target /Plate / Rod /Tube is primarily used in the military for body armor, armored vehicles, and as a component in armor-piercing ammunition due to its combination of hardness, light weight, and ballistic performance.

Q: Can Boron carbide B4C for Boron Carbide B4C Sputtering Target /Plate / Rod /Tube be used in high-temperature applications?
A: Yes, Boron carbide B4C for Boron Carbide B4C Sputtering Target /Plate / Rod /Tube maintains its structural integrity and properties up to very high temperatures, making it suitable for use in extreme heat environments such as furnace linings and high-temperature ceramics.

Boron carbide B4C for Boron Carbide B4C Sputtering Target /Plate / Rod /Tube

(Boron carbide B4C for Boron Carbide B4C Sputtering Target /Plate / Rod /Tube)

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